Microstructural and magnetic properties of thin obliquely deposited films: A simulation approach
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URI (для ссылок/цитирований):
http://www.sciencedirect.com/science/article/pii/S0304885316317334?via%3Dihubhttps://elib.sfu-kras.ru/handle/2311/69753
Автор:
Solovev, P. N.
Izotov, A. V.
Belyaev, B. A.
Коллективный автор:
Институт инженерной физики и радиоэлектроники
Научно-исследовательская часть
Кафедра радиотехники
Дата:
2017-05Журнал:
Journal of Magnetism and Magnetic MaterialsКвартиль журнала в Scopus:
Q1Квартиль журнала в Web of Science:
Q2Библиографическое описание:
Solovev, P. N. Microstructural and magnetic properties of thin obliquely deposited films: A simulation approach [Текст] / P. N. Solovev, A. V. Izotov, B. A. Belyaev // Journal of Magnetism and Magnetic Materials. — 2017. — Т. 429. — С. 45-51Текст статьи не публикуется в открытом доступе в соответствии с политикой журнала.
Аннотация:
The relation between microstructural and magnetic properties of thin obliquely deposited films has been studied
by means of numerical techniques. Using our developed simulation code based on ballistic deposition model
and Fourier space approach, we have investigated dependences of magnetometric tensor components and
magnetic anisotropy parameters on the deposition angle of the films. A modified Netzelmann approach has been
employed to study structural and magnetic parameters of an isolated column in the samples with tilted
columnar microstructure. Reliability and validity of used numerical methods is confirmed by a good agreement
of the calculation results with each other, as well as with our experimental data obtained by the ferromagnetic
resonance measurements of obliquely deposited thin Ni80Fe20 films. The combination of these numerical
methods can be used to design a magnetic film with a desirable value of uniaxial magnetic anisotropy and to
extract the obliquely deposited film structure from only magnetic measurements.