Micromagnetic Simulation of Magnetization Reversal Processes in Thin Obliquely Deposited Films
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URI (для ссылок/цитирований):
http://journal.sfu-kras.ru/article/30000https://elib.sfu-kras.ru/handle/2311/69750
Автор:
Platon N. Solovev
Andrey V. Izotov
Boris A. Belyaev
Коллективный автор:
Институт инженерной физики и радиоэлектроники
Научно-исследовательская часть
Кафедра радиотехники
Дата:
2016-12Журнал:
Journal of Siberian Federal University - Mathematics and PhysicsКвартиль журнала в Scopus:
Q4Библиографическое описание:
Platon N. Solovev. Micromagnetic Simulation of Magnetization Reversal Processes in Thin Obliquely Deposited Films [Текст] / Platon N. Solovev, Andrey V. Izotov, Boris A. Belyaev // Journal of Siberian Federal University - Mathematics and Physics. — 2016. — Т. 9 (№ 4). — С. 524-527Текст статьи не публикуется в открытом доступе в соответствии с политикой журнала.
Аннотация:
The magnetization reversal processes in thin obliquely deposited films were studied by means of micro-
magnetic modeling. Thin film structures for micromagnetic study were generated by Monte Carlo film
growth simulator. Using obtained hysteresis loops for the generated films, we retrieved coercivity and
remanent magnetization as a function of the deposition angle alpha. The results showed that for films with
alpha<65 degr. the magnetization reversal occurred via coherent rotation of magnetic moments, whereas samples
generated with larger deposition angles reverse their magnetization by the formation of complex quasi-
domain magnetic structures.