Growth simulation and structure analysis of obliquely deposited thin films
URI (для ссылок/цитирований):
https://elib.sfu-kras.ru/handle/2311/33100Автор:
Belyaev, B. A.
Izotov, A. V.
Solovev, P. N.
Коллективный автор:
Институт инженерной физики и радиоэлектроники
Научно-исследовательская часть
Кафедра радиотехники
Дата:
2016-06Журнал:
Russian Physics JournalКвартиль журнала в Scopus:
Q3Квартиль журнала в Web of Science:
Q4Библиографическое описание:
Belyaev, B. A. Growth simulation and structure analysis of obliquely deposited thin films [Текст] / B. A. Belyaev, A. V. Izotov, P. N. Solovev // Russian Physics Journal. — 2016. — Т. 59 (№ 2). — С. 301-307Текст статьи не публикуется в открытом доступе в соответствии с политикой журнала.
Аннотация:
Based on the Monte Carlo method, a model of growth of thin films prepared by oblique angle deposition of
particles is constructed. The morphology of structures synthesized by simulation is analyzed. To study the
character of distribution of microstructural elements (columns) in the film plane, the autocorrelation function
of the microstructure and the fast Fourier transform are used. It is shown that with increasing angle of particle
incidence, the film density monotonically decreases; in this case, anisotropy arises and monotonically
increases in the cross sections of columns, and the anisotropy of distribution of columns in the substrate plane
also increases.